Thermal Analysis and Control for Sputtering Deposition of High-Tc Superconducting Films

[+] Author and Article Information
M. I. Flik, B. I. Choi

Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139

A. C. Anderson

Lincoln Laboratory, Massachusetts Institute of Technology, Cambridge, MA 02139

A. C. Westerheim

Lincoln Laboratory and Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139

J. Heat Transfer 114(1), 255-263 (Feb 01, 1992) (9 pages) doi:10.1115/1.2911255 History: Received September 24, 1990; Revised July 01, 1991; Online May 23, 2008


For the preparation of high-quality films of high-Tc superconductors (HTSC) on crystalline substrates, it is necessary to control the substrate temperature accurately during deposition. This study shows that thermal radiation heat transfer in the deposition chamber governs the substrate temperature. The application of thin-film optics yields the emittance of the substrate holder-substrate-film composite as a function of the thickness of the growing film. In a single-target off-axis sputtering system, the substrate temperature is measured during film deposition using a novel method for the attachment of a thermocouple to the substrate front surface. For constant heater power, the measurements show a decrease of the substrate temperature, in agreement with the theoretical prediction. Based on the substrate emittance variation determined in this work, a pyrometric in-situ temperature measurement technique can be developed.

Copyright © 1992 by The American Society of Mechanical Engineers
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