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RESEARCH PAPERS: Radiative Transfer

Transient Optical Transmission Measurement in Excimer-Laser Irradiation of Amorphous Silicon Films

[+] Author and Article Information
H. K. Park, X. Xu, C. P. Grigoropoulos

Department of Mechanical Engineering, University of California, Berkeley, CA 94720

N. Do, L. Klees, P. T. Leung, A. C. Tam

IBM Research Division, Almaden Research Center, San Jose, CA 95120-6099

J. Heat Transfer 115(1), 178-183 (Feb 01, 1993) (6 pages) doi:10.1115/1.2910645 History: Received April 01, 1992; Revised August 01, 1992; Online May 23, 2008

Abstract

The transient temperature field development during heating of an amorphous silicon (a-Si) film, deposited on a fused quartz substrate, by pulsed excimer laser irradiation is studied. Static reflectivity and transmissivity measurements are used to obtain the thin film optical properties at elevated temperatures. Experimental in-situ, transient, optical transmission data are compared with heat transfer modeling results. The variation with temperature of the material complex refractive index across the thin film thickness is taken into account. The effects of the film thickness and thermal diffusivity, as well as of the laser pulse shape, are discussed.

Copyright © 1993 by The American Society of Mechanical Engineers
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