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TECHNICAL NOTES

Thermal Analysis of Multiphoton Absorption at 193 nm in Volume-Absorbing Glass

[+] Author and Article Information
Z. M. Zhang, D. H. Chen

Department of Mechanical Engineering, University of Florida, Gainesville, FL 32611

J. Heat Transfer 124(2), 391-394 (Aug 23, 2001) (4 pages) doi:10.1115/1.1447940 History: Received March 01, 2001; Revised August 23, 2001
Copyright © 2002 by ASME
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References

Dowell, M. L., Cromer, C. L., Leonhardt, R. W., and Scott, T. R., 1998, “Deep Ultraviolet Laser Metrology for Semiconductor Photolithography,” in Characterization and Metrology for ULSI Technology, D. G. Seiler et al., eds. (AIP, College Park, MD), CP449, pp. 539–541.
Chen,  D. H., and Zhang,  Z. M., 2000, “Thermal Analysis of the Volume Absorber in Pulsed Excimer Laser Calorimeters,” Int. J. Heat Mass Transf., 43, pp. 3061–3072.
Taylor,  A. J., Gibson,  R. B., and Roberts,  J. P., 1988, “Two-Photon Absorption at 248 nm in Ultraviolet Window Materials,” Opt. Lett., 13, pp. 814–816.
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Seward,  T. P., Smith,  C., Borrelli,  N. F., and Allan,  D. C., 1997, “Densification of Synthetic Fused Silica Under Ultraviolet Irradiation,” J. Non-Cryst. Solids, 222, pp. 407–414.
Mann, K., Apel, O., and Eva, E., 1998, “Characterization of Absorption and Scatter Losses on Optical Components for ArF Excimer Lasers,” SPIE Proc., 3578 , pp. 614–624.
Weitzman,  P. S., and Osterberg,  U., 1996, “Two-Photon Absorption and Photoconductivity in Photosensitive Glasses,” J. Appl. Phys., 79, pp. 8648–8655.
Stuart,  B. C., Feit,  M. D., Herman,  S., Rubenchik,  A. M., Shore,  B. W., and Perry,  M. D., 1996, “Nanosecond-to-Femtosecond Laser-Induced Breakdown in Dielectrics,” Phys. Rev. B, 53, pp. 1749–1761.

Figures

Grahic Jump Location
Schematic of the thermal model (not to scale)
Grahic Jump Location
Intensity distribution in the z direction
Grahic Jump Location
Normalized penetration depth as a function of βI0
Grahic Jump Location
Peak temperature rise versus the pulse energy for different β values
Grahic Jump Location
Temperature histories for multiple-pulse heating at the center of the glass surface (upper) and the center of the interface (lower)

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