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TECHNICAL PAPERS: Heat Transfer in Manufacturing

Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor

[+] Author and Article Information
A. G. Mathews, J. E. Peterson

Department of Mechanical Engineering, University of Florida, Gainesville, FL 32611

J. Heat Transfer 124(3), 564-570 (May 10, 2002) (7 pages) doi:10.1115/1.1469525 History: Received March 28, 2001; Revised November 19, 2001; Online May 10, 2002
Copyright © 2002 by ASME
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References

Fair, R. B., 1993, Rapid Thermal Processing, Academic Press, San Diego, CA.
Coltrin,  M. E., Kee,  R. J., and Miller,  J. A., 1984, “A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor,” J. Electrochem. Soc., 131, pp. 425–434.
Coltrin,  M. E., Kee,  R. J., and Miller,  J. A., 1988, “A Mathematical Model of Silicon Chemical Vapor Deposition,” Journal of Electrochemical Society: Solid-State Science and Technology, 133, pp. 1206–1213.
Jensen,  K. F., Einset,  E. O., and Fotiadis,  D. I., 1991, “Flow Phenomena in Chemical Vapor Deposition of Thin Films,” Annu. Rev. Fluid Mech., 23, pp. 197–232.
Evans,  G., and Greif,  R., 1987, “A Numerical Model of the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor,” ASME J. Heat Transfer, 109, pp. 928–935.
Evans,  G., and Greif,  R., 1989, “A Study of Traveling Wave Instabilities in a Horizontal Channel Flow with Applications to Chemical Vapor Deposition,” Int. J. Heat Mass Transf., 32, pp. 895–911.
Evans,  G., and Greif,  R., 1993, “Thermally Unstable Convection with Applications to Chemical Vapor Deposition Channel Reactors,” Int. J. Heat Mass Transf., 36, pp. 2769–2781.
Mahajan,  R. L., and Wei,  C., 1991, “Buoyancy, Soret, Dufour and Variable Property Effects in Silicon Epitaxy,” ASME J. Heat Transfer, 113, pp. 688–696.
Fotiadis,  D. I., Kremer,  A. M., McKenna,  D. R., and Jensen,  K. F., 1987, “Complex Flow Phenomena in Vertical MOCVD Reactors: Effects on Deposition Uniformity and Interface Abruptness,” J. Cryst. Growth, 85, pp. 154–164.
Fotiadis,  D. I., Boekhold,  M., Jensen,  K. F., and Richter,  W., 1990, “Flow and Heat Transfer in CVD Reactors: Comparison and Raman Temperatures and Finite Element Model Predictions,” J. Cryst. Growth, 100, pp. 577–589.
Fotiadis,  D. I., Kieda,  S., and Jensen,  K. F., 1990, “Transport Phenomena in Vertical Reactors for Metalorganic Vapor Phase Epitaxy,” J. Cryst. Growth, 102, pp. 441–470.
Merchant,  T. P., Cole,  J. V., Knutson,  K. L., Hebb,  J. P., and Jensen,  K. F., 1996, “A Systematic Approach to Simulating Rapid Thermal Processing Systems,” J. Electrochem. Soc. 143, pp. 2035–2043.
Hebb,  J. P., and Jensen,  K. F., 1996, “The Effect of Multilayer Patterns on Temperature Uniformity During Rapid Thermal Processing,” J. Electrochem. Soc. 143, pp. 1142–1151.
Kelkar, A. S., and Mahajan, R. L., 1997, “Two and Three-Dimensional Transport Models for MOCVD Reactors: Effect of Boundary Conditions,” 1997 National Heat Transfer Conference.
Mihopoulos,  T. G., Hummel,  S. G., and Jensen,  K. F., 1998, “Simulation of Flow and Growth Phenomena in a Close-Spaced Reactor,” J. Cryst. Growth 195, pp. 725–732.
Soong,  C. Y., Chyuan,  C. H., and Tzong,  R. Y., 1998, “Thermo-Flow Structure and Epitaxial Uniformity in Large-Scale Metalorganic Chemical Vapor Deposition Reactors with Rotating Susceptor and Inlet Flow Control,” Jpn. J. Appl. Phys., Part 1, 37, pp. 5823–5834.
Wang,  C. A., Groves,  S. H., Palmateer,  S. C., Wayburne,  D. W., and Brown,  R. A., 1986, “Flow Visualization Studies for Optimization of OMVPE Reactor Design,” J. Cryst. Growth, 77, pp. 136–143.
Gadgil,  P. N., 1993, “Optimization of a Stagnation Point Flow Reactor Design for Metalorganic Chemical Vapor Deposition by Flow Visualization,” J. Cryst. Growth, 134, pp. 302–312.
Salim,  S., Wang,  C. A., Driver,  R. D., and Jensen,  K. F., 1996, “In situ Concentration Monitoring in a Vertical OMPVE Reactor by Fiber-Optics-Based Fourier Transform Infrared Spectroscopy,” J. Cryst. Growth, 169, pp. 443–449.
Johnson,  E. J., Hyer,  P. V., Culotta,  P. W., and Clark,  I. O., 1998, “Evaluation of Infrared Thermography as a Diagnostic Tool in CVD Applications,” J. Cryst. Growth, 187, pp. 463–473.
Horton,  J. F., and Peterson,  J. E., 1999, “Transient Temperature Measurements in an Ideal Gas by Laser-Induced Rayleigh Light Scattering,” Rev. Sci. Instrum., 70, pp. 3222–3226.
Horton,  J. F., and Peterson,  J. E., 2000, “Rayleigh Light Scattering Measurements of Transient Gas Temperature in a Rapid Chemical Vapor Deposition Reactor,” ASME J. Heat Transfer, 122, pp. 165–170.
Holman, J. P., 1994, Experimental Methods for Engineers, McGraw-Hill, Inc., New York.
Van de Hulst, H. C., 1953, Light Scattering by Small Particles, Chapmann & Hall, London.
Kerker, M., 1969, The Scattering of Light, Academic Press, New York.
Bohren, C. F., and Huffman, D. R., 1983, Absorption and Scattering of Light by Small Particles, John Wiley & Sons, New York.
Pitz,  R. W., Cattolica,  R., Bobben,  F., and Talbot,  F., 1976, “Temperature and Density in a Hydrogen-Air Flame From Rayleigh Light Scattering,” Combust. Flame, 27, pp. 313–320.
Pitz,  W. M., and Kashiwagi,  T., 1984, “The Application of Laser-Induced Rayleigh Light Scattering to the Study of Turbulent Mixing,” J. Fluid Mech., 141, pp. 391–429.
Behringer,  R. P., and Ahlers,  G., 1982, “Heat Transport and Temporal Evolution of Fluid Flow Near the Rayleigh-Benard Instability in Cylindrical Containers,” J. Fluid Mech., 125, pp. 219–258.

Figures

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Schematic of test section used to simulate an axisymmetric, impinging jet RTCVD reactor
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Schematic of flow visualization apparatus
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Schematic of laser induced Rayleigh light scattering optical components
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(a) Momentum dominated flow (Rei=30; GrH=0); (b) first instability (Rei=30; GrH≈3500); (c) stable buoyant flow (Rei=45; GrH≈31,000); (d) second instability (Rei=45; GrH≈30,000); and (e) momentum dominated, high temperature (Rei=30; GrH≈11,500)
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Flow transitions as a function of Grashof and dimensionless wafer temperature for Reynolds numbers from 15 to 60, H/Dw=0.2756 to 0.5513, and pressures of 0.02 ATM to 0.05 ATM. The shaded area at the bottom of each graph indicates stable momentum driven flow, and the striped area at the top is a region of stable, buoyancy dominated flow. The central white area flow conditions create either unstable flows, or in some cases apparently stable momentum dominated flow which subsequently becomes unstable. (a) Rei=15, H/Dw=0.3526; (b) Rei=30, H/Dw=0.2756 (gray symbols), H/Dw=0.3526 (black symbols); (c) Rei=45, H/Dw=0.3526; (d) Rei=60, H/Dw=0.3526; and (e) Rei=30, H/Dw=0.5513.
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Initial instability (all pressures included). The two lower length ratios approach the analytic solution for a cylinder heated from below 29. The highest length ratio appears significantly different.
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Stable flows at peak GrH for various Reynolds numbers. Triangles indicate conditions that led to first a stable buoyant flow followed by a high temperature momentum dominated flow.
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(a) Rayleigh light scattering measurements of temperature for pressure of 0.15 ATM, H/Dw=0.3526 and Rei=45. Symbols are the same as those used in Fig. 4; (b) Rayleigh light scattering measurements of temperature for pressure of 0.1 ATM, H/Dw=0.3526 and Rei=30. Symbols are the same as those used in Fig. 4.

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