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RESEARCH PAPER

Submicron Heat Transport Model in Silicon Accounting for Phonon Dispersion and Polarization

[+] Author and Article Information
Sreekant V. J. Narumanchi

National Revewable Energy Laboratory, 1617 Cole Boulevard, Golden, CO 80401

Jayathi Y. Murthy

School of Mechanical Engineering, Purdue University, 585 Purdue Mall, West Lafayette, IN 47907

Cristina H. Amon

Institute for Complex Engineered Systems and Department of Mechanical Engineering, Carnegie Mellon University, 5000 Forbes Avenue, Pittsburgh, PA 15213

J. Heat Transfer 126(6), 946-955 (Jan 26, 2005) (10 pages) doi:10.1115/1.1833367 History: Received August 04, 2003; Revised September 28, 2004; Online January 26, 2005
Copyright © 2004 by ASME
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References

Figures

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(a) Experimental dispersion curve in the [001] direction in silicon at 300 K 48; (b) spline curve fit to the LA and TA branches
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Coordinates axes and representative phonon direction
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Volumetric specific heat of silicon at different temperatures
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Steady 1D transport between parallel plates
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1D transient diffusion with one spectral band
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1D transient diffusion, with 3×3×1 spectral bands
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Bulk thermal conductivity of silicon at different temperatures; experimental data from Holland 49
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Undoped silicon thin film in-plane thermal conductivity; experimental data are from Asheghi et al. 20 (for the 0.42 and 1.6 μm films), and from Asheghi et al. 21 (for the 3.0 μm film)
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Doped 3.0 μm silicon thin film in-plane thermal conductivity; experimental data are from Asheghi et al. 21

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