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TECHNICAL PAPERS: Heat Transfer in Manufacturing

Rayleigh Light Scattering Measurements of Transient Gas Temperature in a Rapid Chemical Vapor Deposition Reactor

[+] Author and Article Information
J. F. Horton, J. E. Peterson

Department of Mechanical Engineering, University of Florida, Gainesville, FL 32611-6300

J. Heat Transfer 122(1), 165-170 (Sep 07, 1999) (6 pages) doi:10.1115/1.521447 History: Received December 11, 1998; Revised September 07, 1999
Copyright © 2000 by ASME
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References

Figures

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Schematic of impinging jet RCVD reactor and carrier gas recirculations induced by momentum dominated flow (left) or buoyancy dominated flow (right)
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Schematic of RLS optical system
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Schematic of test section
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(a) Schematic of flow visualization optical arrangement; (b) photograph of buoyancy-dominated flow
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Temperature as a function of time at four radial locations. Each point indicates the mean of 500 data points taken over one second. Error bars indicating uncertainty in temperature (95 percent confidence limits) are about the size of symbols.
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Instantaneous gas temperature at four different times during the wafer heating: 0–1 s, 120–121 s, 300–301 s, and 480–481 s. (a) r/ro=0.0; (b) r/ro=0.17; (c) r/ro=0.33; (d) r/ro=0.66.

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