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TECHNICAL PAPERS: Heat Transfer in Manufacturing

Rayleigh Light Scattering Measurements of Transient Gas Temperature in a Rapid Chemical Vapor Deposition Reactor

[+] Author and Article Information
J. F. Horton, J. E. Peterson

Department of Mechanical Engineering, University of Florida, Gainesville, FL 32611-6300

J. Heat Transfer 122(1), 165-170 (Sep 07, 1999) (6 pages) doi:10.1115/1.521447 History: Received December 11, 1998; Revised September 07, 1999
Copyright © 2000 by ASME
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References

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Figures

Grahic Jump Location
Schematic of impinging jet RCVD reactor and carrier gas recirculations induced by momentum dominated flow (left) or buoyancy dominated flow (right)
Grahic Jump Location
Schematic of RLS optical system
Grahic Jump Location
Schematic of test section
Grahic Jump Location
(a) Schematic of flow visualization optical arrangement; (b) photograph of buoyancy-dominated flow
Grahic Jump Location
Temperature as a function of time at four radial locations. Each point indicates the mean of 500 data points taken over one second. Error bars indicating uncertainty in temperature (95 percent confidence limits) are about the size of symbols.
Grahic Jump Location
Instantaneous gas temperature at four different times during the wafer heating: 0–1 s, 120–121 s, 300–301 s, and 480–481 s. (a) r/ro=0.0; (b) r/ro=0.17; (c) r/ro=0.33; (d) r/ro=0.66.

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