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Journal Articles

A Computational Fluid Dynamics-Based Sensitivity Analysis of the Chemical Vapor Analysis Process to Synthesize Carbon Nanotubes

C. Teixeira, A. F. Silva, L. A. Rocha
Journal: Journal of Thermal Science and Engineering Applications
Publisher: ASME
Article Type: Research Papers
J. Thermal Sci. Eng. Appl. February 2020, 12(1): 011010.
Paper No: TSEA-18-1496
https://doi.org/10.1115/1.4044424
Published Online: September 7, 2019
View Article titled, A Computational Fluid Dynamics-Based Sensitivity Analysis of the Chemical Vapor Analysis Process to Synthesize Carbon Nanotubes
Open the PDF for A Computational Fluid Dynamics-Based Sensitivity Analysis of the Chemical Vapor Analysis Process to Synthesize Carbon Nanotubes in another window
Topics: Carbon nanotubes, Chemical vapor deposition, Computational fluid dynamics, Flow (Dynamics), Sensitivity analysis, Simulation, Temperature, Furnaces, Fluids, Errors
Journal Articles

Fabrication of Gallium Nitride Films in a Chemical Vapor Deposition Reactor

J. Meng, S. Wong, Y. Jaluria
Journal: Journal of Thermal Science and Engineering Applications
Publisher: ASME
Article Type: Research-Article
J. Thermal Sci. Eng. Appl. June 2015, 7(2): 021003.
Paper No: TSEA-14-1170
https://doi.org/10.1115/1.4029353
Published Online: June 1, 2015
View Article titled, Fabrication of Gallium Nitride Films in a Chemical Vapor Deposition Reactor
Open the PDF for Fabrication of Gallium Nitride Films in a Chemical Vapor Deposition Reactor in another window
Topics: Chemical vapor deposition, Computer simulation, Disks, Flow (Dynamics), Gallium nitride, Manufacturing, Metalorganic chemical vapor deposition, Pressure, Semiconductor wafers, Temperature